slide 1

Back to the List of the Granted Patents                                                Click here to download AP2007 PDF

(11)    Patent No :    AP 2007    (73) Applicant(s)       
(21)    Application No :    AP/P/2006/003739    WEIR SLURRY GROUP, INC, 2701 South Stoughton Road,       
            Madison, WI 53716,       
                   
(22)    Filing Date :    30.03.2005    United States of America       
(24)    Date of Grant &    22.06.2009           
                   
(45)    Publication :

(30)    Priority Data            (72) Inventors   
    (33) Country    (31) Number    (32) Date    WALKER Craig I., Australia   
    US    10/814,427    31.03.2004    ROUDNEV Aleksander S., United States of America   
                   
                (74) Representative   
(84)    Designated State           
                   
    BW  GH   T Z    ZW        GILL, GODLONTON & GERRANS   
                ZIMBABWE       
                   
(51)    International    Classification    B63H 1/16 (2006.01)    B64C 11/01 (2006.01)   

(54)    Title

Improved velocity profile impeller vane

(57)    Abstract

In accordance with the present invention, an impeller for use in a centrifugal pump has at least one vane the radially outer terminal end of which is configured to produce a flow velocity profile that controls and reduces the wear caused by slurry fluid being expelled from the impeller on the inner surface of the pump casing. The impeller vanes of the present invention are generally configured with a radially outwardly extending portion, as compared with the conventional straight or concave edge of an impeller vane. The outwardly extending portion may vary in shape, but is selected to produce a flow velocity profile that reduces wear in the pump casing.


(56)    Documents Cited :    US 3 221 398 A   US 5 628 616 A

Newsletter

Join our newsletter for CIPIT news through subscriptions!

SEND

Social Media

    

Contact Us

TEL : (254) 703 034 612